英语缩略词“NIL”经常作为“Nano-Imprint Lithography”的缩写来使用，中文表示：“纳米压印光刻”。本文将详细介绍英语缩写词NIL所代表英文单词，其对应的中文拼音、详细解释以及在英语中的流行度。此外，还有关于缩略词NIL的分类、应用领域及相关应用示例等。
“NIL”（“纳米压印光刻）释义
- 英文缩写词：NIL
- 英文单词：Nano-Imprint Lithography
- 缩写词中文简要解释：纳米压印光刻
- 中文拼音：nà mǐ yā yìn guāng kè
- 缩写词流行度：636
- 缩写词分类：Miscellaneous
- 缩写词领域：Photography & Imaging
以上为Nano-Imprint Lithography英文缩略词NIL的中文解释，以及该英文缩写在英语的流行度、分类和应用领域方面的信息。
英文缩略词NIL的扩展资料
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Based on the nano-imprint lithography ( NIL ) combining with layered manufacture principle, a novel three-dimensional micro-electronic mechanical system ( MEMS ) fabrication process is investigated.
针对目前微电子机械系统（MEMS）制造中存在的三维加工能力不足的问题，将压印光刻技术和分层制造原理相结合，研究了三维MEMS制造的新工艺。
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Nano-imprint stamp is the most important tool of nano-imprint lithography techniques, the traditional materials are silicon and quartz, but they are brittle and expensive. The researchers are studying a more suitable material as nano-imprint stamp.
纳米压印模板是纳米压印技术最重要的工具，由于传统硅、石英材料的脆性和加工昂贵，研究人员正在研究更适合于纳米压印技术的模板材料。
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With the continuous development of MEMS / NEMS technology, nano-imprint lithography has become one of the focused micro-nano graphics replication process in recent years, and it is considered to be one of the most potential nano lithography technique to replicate large area nanostructures with high-resolution.
随着MEMS/NEMS工艺的不断发展，这一技术成为了近年来微纳图形复制工艺的研究热点之一，被誉为最具有发展潜力的制作纳米结构的技术之一。
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The novel methods include nano-imprint, laser interference lithography, x-ray lithography, electron beam lithography, focused ion beam and so on.
包括纳米压印、激光干涉光刻、x射线光刻、电子束光刻、聚焦离子束刻蚀等。
上述内容是“Nano-Imprint Lithography”作为“NIL”的缩写，解释为“纳米压印光刻”时的信息，以及英语缩略词NIL所代表的英文单词，其对应的中文拼音、详细解释以及在英语中的流行度和相关分类、应用领域及应用示例等。
