Systematic Control Exploitation for Critical Dimension(CD) and Overlay in Photolithography Technology 光刻工艺中对线宽和套刻系统性控制的开发
The relation between critical dimension of Minkowski space and the rank of internal nonabelian gauge group is given. 给出Minkowski空间的临界维数与内部非阿贝尔规范群的秩的关系。
As a critical dimension, it opens the space of the possibility wide for Man's historical development and leads the contemporary Chinese society to make the correct choices in the dialectical unity of the reality and the ideal of Man's all-round development. 作为一个批判性的维度,它为人类的历史发展敞开了可能性的空间,并引导当代中国人和中国社会在人的全面发展的现实和理想的辩证统一中做出正确的选择。
With the decreasing of critical dimension, the influence of chip defects on yield is more and more serious. 随着集成电路工艺尺寸的减小,制造缺陷对芯片成品率的影响越来越大。
With the development of " scaling " in Integrate Circuit, the critical dimension reduces continuously. 随着集成电路按比例缩小趋势的不断发展,刻线临界尺寸(CD)不断减小。