The Study of Add Anti Reflective Coating(ARC) on PHOTO Resist Bottom in Lithography 对光刻工艺中在光阻底部增加抗反射涂层(BARC)的研究
By adding a low index dielectric layer ( MgF_2 ) of thickness λ / 2 as substrate, we have raised the productive ratio of single wave length anti reflective coating greatly. 加镀一层λ/2厚的低折射率介质(MgF2)作为衬底后,大大提高了单波长增透膜的成品率。
A new design and preparation technique about the anti - reflective coating for SHG of KTP ( KTiOPO_4 ) crystals are introduced. The coating is composed of three different films with identical thick - ness. 本文介绍KTP(KTiOPO4)倍频晶体端面等厚度三层倍频双波长增透膜的设计和制备工艺。