It not only affects process windows, i.e., exposure latitude ( EL ) and depth of focus ( DOF ), but also degrades mask error factor ( MEF ), which can introduce extra mask cost. 它不仅影响工艺窗口,即,曝光容裕度和焦深(DOF),而且也降低了掩模误差因子(MEF),这能导致附加的掩模费用。
The impact of the effective resist diffusion length to the exposure latitude and MEF ( mask error factor ) for the 0.13 μ m photolithography and beyond is presented. 展示了在0.13μm及以下工艺中等效扩散对能量裕度和掩模版误差因子的影响的研究结果。