In our CHEACO product program you will find a wide range of oxides suited for physical vapor deposition. 在我们的CHEACO产品计划你会找到一个适合的物理气相沉积(PVD)氧化物广泛。
Uses : sputtering target, physical vapor deposition, high temperature alloys. 溅射靶材、物理气相沉积(PVD)、高温合金。
Application of Thermal-spraying and Electron Beam Physical Vapor Deposition(PVD) Technologies on Preparation of Thermal Barrier Coatings 热喷涂及电子束物理气相沉积(PVD)技术在热障涂层制备中的应用
The refractory metals and refractory metal silicides that are used to augment or replace the polysilicon are generally deposited by physical vapor deposition processes. 用于增强和取代多晶硅的难熔金属和难熔金属硅化物通常是用物理蒸发沉积工艺沉积的。
Uses : sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives. 用途:溅射靶材、物理气相沉积(PVD)、高温合金、用于高压真空开关触头及精密合金添加剂。