Effect of nitridation on the properties of hydride vapor phase epitaxy ( HVPE ) grown GaN films was studied. 研究了衬底氮化过程对于氢化物气相外延(VPE)(HVPE)方法生长的GaN膜性质的影响。
The growth of single crystal AlN films by metal organic vapor phase epitaxy. 单晶AlN薄膜的金属有机气相外延(VPE)生长研究。
The AlN films grown by low pressure metal organic vapor phase epitaxy are doped by Si thermal diffusion using Si and SiNx films as diffusion source, and the roles of Si doping on the electrical properties of AlN films. 采用SiNx和Si为扩散源,对低压金属有机气相外延(VPE)生长的AlN薄膜进行了Si热扩散掺杂,研究了Si掺杂对AlN薄膜电学性质的影响。
The influence of carrier gas ( i.e. N 2 ) flow rate on the optical properties of GaN epilayers on sapphire substrates grown by horizontal halide vapor phase epitaxy ( HVPE ) system was studied. 研究了利用水平氢化物气相外延(VPE)(HVPE)系统在蓝宝石衬底上外延氮化镓(GaN)的生长规律,重点研究了作为载气的氮气流量对GaN膜的结构及光学性质的影响。
Physical methods include evaporation and sputtering; Chemical methods mainly include molecule beam epitaxy ( MBE ), metal organic chemical vapor deposition ( MOCVD ), hydride vapor phase epitaxy ( HVPE ) and so on. 物理方法包括各种蒸发和溅射:化学方法主要包括分子束外延(MBE)、金属有机物化学气相沉积(MOCVD)、氢化物气相外延(VPE)(HVPE)等。