This paper introduces the development of electron beam lithography around the world and basic fundamentals of pattern generator. 论文分析了国内外电子束(E-BEAM)曝光技术的发展和图形发生器的工作原理。
The influence of the beam voltage and magnet field on electron beam performance was studied. 并对电子注在不同工作电压和磁场下的质量进行了分析计算。
Electron beam transverse temperatures on HIRFL-CSR electron cooler are deduced from motion equations of single electron in themagnetic field. 从磁场中单电子的轨道运动方程出发,分析并推出了HIRFL-CSR电子冷却装置上的横向电子束(E-BEAM)温度,并得到了一些重要结论。
The effect of divergence of the incident electron beam on the gain of FEL is analysed. 分析了入射电子束(E-BEAM)的发散性对自由电子激光器增益的影响。
In cathode ray tube display, the continuation of light emission from phosphor after excitation by the electron beam. 在阴极射线管显示器中,用电子束(E-BEAM)激励后荧光物质光发射的持续现象。