Atomic Layer Deposition(ALD) and Its Applications in Optical Thin Films 原子层沉积(ALD)技术及其在光学薄膜中的应用
Preparing aluminum nitride thin film by atomic layer deposition 氮化铝薄膜的原子层淀积制备及应用
Based on the basic principles of atomic layer deposition, we designed four forms of VS-ALDR. Respectively ( 1 ) No aperture fan-shaped inlet design; 依据原子层沉积(ALD)的基本原理,对VS-ALDR进行了四种形式的进口设计方案,分别为(1)无间隙扇形分隔进口设计;
Endcapping of Octadecyl Bonded Silica by Atomic Layer Deposition(ALD) for Separation of Basic Compounds 十八烷基键合硅胶的原子层沉积(ALD)法封尾及其在碱性化合物分离中的应用
In this thesis, the electrochemical atomic layer deposition ( EC-ALD ) method was used to fabricate several functional semiconductor compounds on different substrates, and the application of these thin films such as photoelectrocatalysis and organic degradation were also investigated. 本博士学位论文主要是利用电化学原子层沉积(ALD)法(EC-ALD)在不同基底上沉积制备了几种功能性半导体纳米薄膜材料,并探讨了这些功能薄膜材料在光电催化和有机物降解等方面的应用。